작성일 : 12-12-28 15:19
 Furnace, wafer oxidation (한결산업, LHA-12450).bmp [0] DATE : 2012-12-28 15:19:28 | ||||||||||||||||
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 A list of additional components |
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Detailed specification -Thermal oxidation (Wet and dry)
-Tube inside diameter : 25 ~ 150mm
-뛰어난 온도 Uniform zone 제공
-Mesh cover, natural air cooling
-Heat treatment, Firing
-분위기 gas 하에서 다양한 연구.
-Wafer oxidation, diffusion.
-Type : Horizontal or Vertical
-Max operating
-temperature: 1200℃
-Furnace bore(mm): 160
-Heated length(mm): 450
-Heating element
-Temperature control
-External size(mm): 670(H)×676(W)×468(D)
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Furnace, wafer oxidation (한결산업, LHA-12450)![Furnace, wafer oxidation (한결산업, LHA-12450).bmp [0] DATE : 2012-12-28 15:19:28](javascript:file_download('./download.php?bo_table=Fabrication&wr_id=103&no=0&sca=Fabrication&page=3', 'Furnace, wafer oxidation (한결산업, LHA-12450).bmp');){kind=link}
