작성일 : 12-12-28 11:02
 Spin coater, PR coating (Midas, 3000).bmp [0] DATE : 2012-12-28 11:02:36 | ||||||||||||||||
|
||||||||||||||||
|
||||||||||||||||
|
||||||||||||||||
 A list of additional components- Piece wafer chuck
- 4inch wafer chuck |
||||||||||||||||
|
Detailed specification Photoresist coating
- 4ich chuck - piece wafer chuck Keep clean always
- Chuck rotation speed: 300~8,000rpm
- Spin state: 50steps - Substrate size: piece ~4inch Si wafer - Oil-less vacuum pump |
||||||||||||||||
Spin coater, PR coating (Midas, 3000)![Spin coater, PR coating (Midas, 3000).bmp [0] DATE : 2012-12-28 11:02:36](javascript:file_download('./download.php?bo_table=Fabrication&wr_id=89&no=0&sca=Fabrication&page=5', 'Spin coater, PR coating (Midas, 3000).bmp');){kind=link}
