전남대학교MNTL연구소

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작성일 : 12-12-28 11:35
Photoresist
 글쓴이 : 관리자
조회 : 502  
   Data sheet_PR AZ4500.pdf  DATE : 2012-12-28 11:35:08
   Data sheet_PR AZ5214E.pdf  DATE : 2012-12-28 11:35:08
   Data sheet_PR SU-8 2002-2015.pdf  DATE : 2012-12-28 11:35:08
   Data sheet_PR SU-8 2035-2100.pdf  DATE : 2012-12-28 11:35:08
   Data sheet_resists developers and removers.pdf  DATE : 2012-12-28 11:35:08
   Data sheet_softbake_photoresist.pdf  DATE : 2012-12-28 11:35:08
   Process_AZ1512.pdf  DATE : 2012-12-28 11:35:08
   Process_AZ4335.pdf  DATE : 2012-12-28 11:35:08
   Process_AZ5214_negative.pdf  DATE : 2012-12-28 11:35:08
   Process_AZ5214_positive.pdf  DATE : 2012-12-28 11:35:08
   Process_SU-8(2050).pdf  DATE : 2012-12-28 11:35:08
   Process_SU-8(GM1040).pdf  DATE : 2012-12-28 11:35:08
   Purpose of softbake and proper development process.pdf  DATE : 2012-12-28 11:35:08
   Process_PR removal.pdf  DATE : 2012-12-28 11:35:08
 
- PR data sheet and reference
- MNTL photolithography process condition
- Photoresist removal