작성일 : 12-12-28 11:34
 Pattern generator (μPG 501).bmp [0] DATE : 2012-12-28 11:34:22 | ||||||||||||||||
|
||||||||||||||||
|
||||||||||||||||
|
||||||||||||||||
 A list of additional components |
||||||||||||||||
|
Detailed specification Mask fabrication (5inch)
Direct lithography alignment function - Maximum Substrate Size : 127 x 127 mm²
- Minimum Structure Size [μm] : 1 - Write Speed [mm2/minute] : 50 - Edge Roughness [3σ, nm] : 120 - Line Width Uniformity [3σ, nm] : 200 - Maximum Write Area : 100 x 100 mm² |
||||||||||||||||
Pattern generator (μPG 501)![Pattern generator (μPG 501).bmp [0] DATE : 2012-12-28 11:34:22](javascript:file_download('./download.php?bo_table=Fabrication&wr_id=95&no=0&sca=Fabrication&page=4', 'Pattern generator (μPG 501).bmp');){kind=link}
